青促會會員
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劉靜


  • 類別: 副研究員
  • 研究方向:

      主要從事利用LIGA和光刻技術(shù)研制為光學(xué)元件。面向國家重要需求,研制“卡脖子”的微納元件。 

  • 學(xué)歷: 博士研究生
  • Email: liujing1987@ihep.ac.cn
  • 地址: 北京市石景山區(qū)玉泉路19號乙
  • 郵編: 100049
簡歷介紹

  劉靜,博士,副研究員。2009-07畢業(yè)于中國科學(xué)技術(shù)大學(xué)物理學(xué)專業(yè),獲理學(xué)學(xué)士學(xué)位;2014-07畢業(yè)于中國科學(xué)院大學(xué),獲理學(xué)博士學(xué)位。2014-07進入中科院高能物理研究所多學(xué)科中心工作;2016-12,聘為中科院高能物理研究所多學(xué)科中心, 副研究員。 

承擔(dān)科研項目情況

  1、用LIGA和光刻技術(shù)研制鎳基、 SU8基X射線聚焦元件,為國內(nèi)外光源提供可用聚焦元件。 

  2、用深硅刻蝕技術(shù)研制硅基Kinoform、光柵、波帶片等光學(xué)元件。 

  3、氯化銫納米島自組裝技術(shù)的應(yīng)用研究。 

代表論著(中文)
代表論著(英文)

  1. J. Liu, Y. Z. Xu, F.T. Yi, Fabrication of TiO2 nanorods on Si pillars surface for photosensitive application. Journal of Materials Science: Materials in Electronics 34 (2022) 8171.  

  2. J. Liu, Y. Z. Xu, X.X. Liang, M. M. Yan, B. Wang, T.C. Zhang, Z. Hong, F.T. Yi, ZnO Nanowires/CdS Nanorods Structure Grown on Silica Micropillars Array for Photosensitive Application. Electronic Materials Letters 17 (2021) 507.    

  3. J. Liu, Y. Z. Xu, F.T. Yi, Fabrication and photosensitivity of ZnO/CdS/silica nanopillars based photoresistor. Journal of Materials Science: Materials in Electronics 32 (2021) 11326.    

  4. J. Liu, X.X. Liang, Y. Z. Xu, M. M. Yan, B. Wang, T.C. Zhang, F.T. Yi, Fabrication of tree-like CdS nanorods-Si pillars structure for photosensitive application. Journal of Materials Science: Materials in Electronics 31 (2020) 11862.    

  5. J. Liu, Y. Z. Xu, X.X. Liang, M. M. Yan, B. Wang, T.C. Zhang, F.T. Yi, Fabrication of CdS Nanorods on Si Pyramid Surface for Photosensitive Application. ACS Omega 5 (2020) 11695.    

  6. Liu, X.X. Liang, Y.T. Wang, B. Wang, T.C. Zhang, F.T. Yi, Preparation of CdS nanorods on silicon nanopillars surface by hydrothermal method. Materials Research Bulletin 120 (2019) 110591.    

  7. J. Liu, F.T. Yi, Fabrication and properties of ZnO nanorods on silicon nanopillar surface for gas sensor application. Journal of Materials Science: Materials in Electronics 30 (2019) 11404.    

  8. J. Liu, H. Cheng, Y.C. Li, J.R. Zhang, F.T. Yi. Fabrication of microelectrodes on diamond anvil for the resistance measurement in high pressure experiment. Microsystem Technologies 24 (2018) 3193. 

  9. J. Liu, W.W. Zhang, G.C. Chang, F.T. Yi, Influence of the bridges on prism-array lens focusing for high energy X-rays, Nuclear Inst. and Methods in Physics Research A 910 (2018) 115.    

  10. J. Liu, F. Yi, Y. Zhou, B. Wang, T. Zhang, Y. Wang. Fabrication and Photosensitivity of CdS/Silicon Nanoscrew Photoresistor. Chemistry Select 2 (2017) 8577.   

  11. J. Liu, Y. Liang, L. Wang, B. Wang, T. Zhang, F. Yi. Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate. Materials Science in Semiconductor Processing 56 (2016) 217.    

  12. J. Liu, X. Zhang, G. Sun, Y. Wang, B. Wang, T. Zhang, F. Yi, P. Liu. Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell. Materials Science in Semiconductor Processing 40 (2015) 44.    

  13. J. Liu, X. Zhang, M. Ashmkhan, G. Dong, Y. Liao, B. Wang, T. Zhang, F. Yi. Fabrication of silicon nanopillar arrays by cesium chlorideself-assembly and wet electrochemical etching for solar cell. Applied Surface Science 289 (2014) 300.    

  14. J. Liu, X. Zhang, G. Dong, Y. Liao, B. Wang, T. Zhang, F. Yi. The performance of silicon solar cell with selective pillars fabricated by Cesium Chloride self-assembly lithography and UV-lithography. Solar Energy 105 (2014) 247.   

  15. J. Liu, M. Ashmkhan, G. Dong, B. Wang, F. Yi. Fabrication of micro-nano surface texture by CsCl lithography with antireflection and photoelectronic properties for solar cells. Solar Energy Material and Solar Cells 108 (2013) 93. 

地址:北京市918信箱 郵編:100049 電話:86-10-88235008 Email:ihep@ihep.ac.cn
中國科學(xué)院高能物理研究所 備案序號:京ICP備05002790號-1 文保網(wǎng)安備案號: 110402500050